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1.Duty cycle estimate of photoresist gratings via monitoring TM/TE diffraction efficiency ratio during development

Shen, BY, Zeng, LJ,     More...

APPLIED OPTICS[1559-128X], Published 2016, Volume 55, Issue 30, Pages 8472-8477

收录情况: WOS SCOPUS

WOS核心合集引用:  影响因子:  1.973    找找相关文章  PlumX Metrics

2.Scatterometry specialized for a highly asymmetric triangular grating on a transparent substrate

Yang, Lin, Zeng, Lij     More...

Applied Optics[1559-128X], Published 2014, Volume 53, Issue 6, Pages 1143-1150

收录情况: WOS SCOPUS

WOS核心合集引用:  影响因子:  1.973    找找相关文章  PlumX Metrics

3.In situ monitoring for development of rectangular photoresist gratings on transparent substrates

Wei, SM, Li, LF

APPLIED OPTICS[1559-128X], Published 2010, Volume 49, Issue 3, Pages 430-436

收录情况: WOS SCOPUS

WOS核心合集引用:  影响因子:  1.973    找找相关文章  PlumX Metrics

4.Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network

Wei, SM, Li, LF

APPLIED OPTICS[1559-128X], Published 2008, Volume 47, Issue 13, Pages 2524-2532

收录情况: WOS

WOS核心合集引用: 15  影响因子:  1.973    找找相关文章  PlumX Metrics

5.Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask

Lin, H, Li, LF

APPLIED OPTICS[1559-128X], Published 2008, Volume 47, Issue 33, Pages 6212-6218

收录情况: WOS SCOPUS

WOS核心合集引用: 15  影响因子:  1.973    找找相关文章  PlumX Metrics

6.Measurement of duty cycles of photoresist grating masks made on top of multilayer dielectric stacks

Li, LF, Zeng, LJ

APPLIED OPTICS[1559-128X], Published 2005, Volume 44, Issue 21, Pages 4494-4500

收录情况: WOS SCOPUS

WOS核心合集引用:  影响因子:  1.973    找找相关文章  PlumX Metrics

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